Detection of osteoporosis by morphological granulometries

Edward R. Dougherty, Yidong Chen, Saara M.D. Totterman, Joseph P. Hornak

Producción científica: Conference contribution

5 Citas (Scopus)

Resumen

Local morphological granulometries are generated by opening an image successively by an increasing family of structuring elements and, at each pixel, keeping an image area count in a fixed-size window about the pixel. After normalization there is at each pixel a probability density, called a `local pattern spectrum,' and the moments of this density are used to classify the pixel according to surrounding texture. The method having been developed for binary images, the present paper applies a gray-scale version of the methodology to detect osteoporosis in magnetic resonance (MR) images of the wrist. Maximum-likelihood classification is used to apply the local-pattern-spectra moment information. Owing to the presence of a continuous intertwined network of bone fibers called trabeculae, when imaged by an MR imaging system a normal region of bone tissue possesses a coarse, grainy texture resulting in characteristic granulometric features. Osteoporosis is a metabolic bone disease typified by a gradual loss of trabecular bone, and this loss is revealed by significant changes in the granulometric features, thereby leading to detection.

Idioma originalEnglish (US)
Título de la publicación alojadaProceedings of SPIE - The International Society for Optical Engineering
EditorialPubl by Int Soc for Optical Engineering
Páginas666-680
Número de páginas15
Ediciónpt 1
ISBN (versión impresa)081940814X
EstadoPublished - 1992
Publicado de forma externa
EventoBiomedical Image Processing and Three-Dimensional Microscopy. Part 1 (of 2) - San Jose, CA, USA
Duración: feb 10 1991feb 13 1991

Serie de la publicación

NombreProceedings of SPIE - The International Society for Optical Engineering
Númeropt 1
Volumen1660
ISSN (versión impresa)0277-786X

Other

OtherBiomedical Image Processing and Three-Dimensional Microscopy. Part 1 (of 2)
CiudadSan Jose, CA, USA
Período2/10/912/13/91

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Condensed Matter Physics
  • Computer Science Applications
  • Applied Mathematics
  • Electrical and Electronic Engineering

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