Abstract
A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.
Original language | English (US) |
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Pages (from-to) | 27-35 |
Number of pages | 9 |
Journal | Sensors and Actuators, A: Physical |
Volume | 58 |
Issue number | 1 |
DOIs | |
State | Published - Jan 1997 |
Keywords
- Neural probes
- Neurobiology
- Plasma etching
ASJC Scopus subject areas
- Electronic, Optical and Magnetic Materials
- Instrumentation
- Condensed Matter Physics
- Surfaces, Coatings and Films
- Metals and Alloys
- Electrical and Electronic Engineering