Plasma-etched neural probes

David T. Kewley, Matthew D. Hills, David A. Borkholder, Ion E. Opris, Nadim I. Maluf, Christopher W. Storment, James M. Bower, Gregory T.A. Kovacs

Research output: Contribution to journalArticle

85 Scopus citations

Abstract

A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.

Original languageEnglish (US)
Pages (from-to)27-35
Number of pages9
JournalSensors and Actuators, A: Physical
Volume58
Issue number1
DOIs
StatePublished - Jan 1997

Keywords

  • Neural probes
  • Neurobiology
  • Plasma etching

ASJC Scopus subject areas

  • Electronic, Optical and Magnetic Materials
  • Instrumentation
  • Condensed Matter Physics
  • Surfaces, Coatings and Films
  • Metals and Alloys
  • Electrical and Electronic Engineering

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