Plasma-etched neural probes

David T. Kewley; Matthew D. Hills; David A. Borkholder; Ion E. Opris; Nadim I. Maluf; Christopher W. Storment; James M. Bower; Gregory T.A. Kovacs

doi:10.1016/S0924-4247(97)80221-X

Plasma-etched neural probes

David T. Kewley, Matthew D. Hills, David A. Borkholder, Ion E. Opris, Nadim I. Maluf, Christopher W. Storment, James M. Bower, Gregory T.A. Kovacs

Radiology

Research output: Contribution to journal › Article › peer-review

86 Scopus citations

Abstract

A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.

Original language	English (US)
Pages (from-to)	27-35
Number of pages	9
Journal	Sensors and Actuators, A: Physical
Volume	58
Issue number	1
DOIs	https://doi.org/10.1016/S0924-4247(97)80221-X
State	Published - Jan 1997

Keywords

Neural probes
Neurobiology
Plasma etching

ASJC Scopus subject areas

Electronic, Optical and Magnetic Materials
Instrumentation
Condensed Matter Physics
Surfaces, Coatings and Films
Metals and Alloys
Electrical and Electronic Engineering

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10.1016/S0924-4247(97)80221-X

Cite this

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title = "Plasma-etched neural probes",

abstract = "A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.",

keywords = "Neural probes, Neurobiology, Plasma etching",

author = "Kewley, {David T.} and Hills, {Matthew D.} and Borkholder, {David A.} and Opris, {Ion E.} and Maluf, {Nadim I.} and Storment, {Christopher W.} and Bower, {James M.} and Kovacs, {Gregory T.A.}",

note = "Funding Information: This work has been funded by the National Science Foun-:lation under grant # PC147129-I. Additional support was provided by Medtronic, Inc. Karim Elaagouby, Mike Wehr, and Nick Mellen have contributed to this research by providing additional experimental preparations.",

year = "1997",

month = jan,

doi = "10.1016/S0924-4247(97)80221-X",

language = "English (US)",

volume = "58",

pages = "27--35",

journal = "Sensors and Actuators A: Physical",

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T1 - Plasma-etched neural probes

AU - Kewley, David T.

AU - Hills, Matthew D.

AU - Borkholder, David A.

AU - Opris, Ion E.

AU - Maluf, Nadim I.

AU - Storment, Christopher W.

AU - Bower, James M.

AU - Kovacs, Gregory T.A.

N1 - Funding Information: This work has been funded by the National Science Foun-:lation under grant # PC147129-I. Additional support was provided by Medtronic, Inc. Karim Elaagouby, Mike Wehr, and Nick Mellen have contributed to this research by providing additional experimental preparations.

PY - 1997/1

Y1 - 1997/1

N2 - A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.

AB - A new method is presented for microfabricating silicon-based neural probes that are designed for neurobiology research. Such probes provide unique capabilities to record high-resolution signals simultaneously from multiple, precisely defined locations within neural tissue. The fabrication process utilizes a plasma etch to define the probe outline, resulting in sharp tips and compatibility with standard CMOS processes. A low-noise amplifier array has been fabricated through the MOSIS service to complete a system that has been used in multiple successful physiological experiments.

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KW - Neurobiology

KW - Plasma etching

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Plasma-etched neural probes

Abstract

Keywords

ASJC Scopus subject areas

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