Fabrication of microstructures using aluminum anodization techniques

Ahmed Nadeem, Mark Mescher, Keith Rebello, Lee E. Weiss, Clarence Wu, Marc Feldman, Michael L. Reed

Research output: Contribution to conferencePaperpeer-review

13 Scopus citations


A promising technique for the fabrication of high-aspect-ratio microstructures, presented by Tan el. al. at MEMS-95, takes advantage of the highly ordered pore structure of anodic metal oxides. In this work, we have extended and simplified this method. This process is capable of producing high-aspect-ratio microstructures oriented normal to a nonplanar substrate. Unlike the original process in which the aluminum substrate was anodized to the desired depth, masked and subsequently etched, the modified process involves performing the masking lithography prior to anodization. Patterned areas of an aluminum substrate are masked with a 0.6 μm layer of sputtered silicon dioxide. The SiO2 layer prevents anodization in masked areas while the oxide grows in unmasked areas. In this paper, we present preliminary results using this local anodization process on aluminum substrates and discuss the use of the process for fabricating structures on nonplanar substrates.

Original languageEnglish (US)
Number of pages4
StatePublished - Jan 1 1998
Externally publishedYes
EventProceedings of the 1998 IEEE 11th Annual International Workshop on Micro Electro Mechanical Systems - Heidelberg, Ger
Duration: Jan 25 1998Jan 29 1998


OtherProceedings of the 1998 IEEE 11th Annual International Workshop on Micro Electro Mechanical Systems
CityHeidelberg, Ger

ASJC Scopus subject areas

  • Control and Systems Engineering
  • Mechanical Engineering
  • Electrical and Electronic Engineering


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